Synergetic Plasma-Catalytic Design for Gas Abatement from Semiconductor Processes

This research is an effort to develop plasma-catalytic technologies that abate targeted molecules from semiconductor exhaust streams (e.g., CF₄, NF₃, and N₂O) into more desirable products (e.g., COF₂, N₂, O₂) efficiently (Fig. 1). The research team expects to develop a framework to design, characterize, and evaluate synergies between catalysts and non-thermal plasmas that lead to high energy efficiencies, resistance to catalytic poisoning, and the high destruction and removal efficiency (DRE) of targeted molecules